English

Projetos Apoiados

Sistema de deposição: Molecular Beam Epitaxy (MBE) chamber e Pulsed Laser Deposition (PLD) chamber

Molecular Beam Epitaxy (MBE) chamber: - 5 axis manipulator; e-beam heating up to 1100 K; cooling down to 100 K. - Quartz microbalance - Two single pockets evaporators (rods or crucibles); - Two four pockets evaporators (rods or crucibles); - Motorized shutter to grow variable thickness films; -LEED; -RHEED; - Automatic needle valve for sputtering. Pulsed Laser Deposition (PLD) chamber: - Six 25mm targets; - Excimer ablation laser: Coherent’s 102F, 248 nm, 400 mJ pulse, 20 Hz max repetition rate; - 3 automatic gas lines with mass controlers; - High pressure RHEED; - Laser heating of the substrate up to 1100 K.
FABRICACAO E ESTUDO DA ESTRUTURA ELETRONICA DE HETEROESTRUTURAS DE OXIDOS MULTIFERROICOS.
  • JULIO CRIGINSKI CEZAR
  • Processo FAPESP 2012/51198-2
  • Centro Nacional de Pesquisa em Energia e Materiais
  • MCTI
  • São Paulo
http://lnls.cnpem.br/uvx/linhas-de-luz/



R. Pio XI, 1500 - Alto da Lapa - CEP 05468-901 São Paulo/SP - Brasil
Tel: (+55) 11 3838-4000 Fax: (+55) 3645-2421